000 01226cam a22003254a 4500
999 _c267
_d267
001 1213501
003 OSt
005 20170410112720.0
008 990324s1999 nyu bf 001 0 eng
010 _a 99026065
020 _a0815514328 (hbk):
_cUSD 245.00
040 _aDLC
_cIISER- BPR
_dDLC
042 _apcc
050 0 0 _aTS695
_b.P52 1999
082 0 0 _223rd
_a671.735
_bPIE/H
100 1 _aPierson, Hugh O.
222 _aChemistry
245 1 0 _aHandbook of chemical vapor deposition (CVD) : principles, technology, and applications /
_cby Hugh O. Pierson.
250 _a2nd ed.
260 _aNew York :
_bNoyes Publications,
_cc1999.
300 _axxiv., 482 p. :
_bill. ;
_c24 cm.
504 _aIncludes bibliographical references and Index.
650 0 _aChemical vapor deposition
_vHandbooks, manuals, etc.
650 0 _aVapor-plating
_vHandbooks, manuals, etc.
650 0 _xChemistry
856 4 2 _3Publisher description
_uhttp://www.loc.gov/catdir/description/wap041/99026065.html
856 4 1 _3Table of contents
_uhttp://www.loc.gov/catdir/toc/wap041/99026065.html
906 _a7
_bcbc
_corignew
_d1
_eocip
_f19
_gy-gencatlg
942 _2ddc
_cBK