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Thin film ferroelectric materials and devices/

Thin film ferroelectric materials and devices/ edited by R. Ramesh. - Boston: Kluwer Academic Publishers, c1997. - vii, 249 p. : ill. ; 24 cm. - Electronic materials: science & technology .

Includes bibliographical references and index.

Thin Film Ferroelectric Materials and Devices is a compilation of current research and development in two very important ferroelectric device technologies, namely ferroelectrics for Dynamic Random Access Memories (DRAM's) and Non-Volatile Ferroelectric Random Access Memories (NV-FRAM's). Given the rapid pace of development and the broad scope of the general topic of ferroelectric materials, readers will benefit from such a focused presentation. Thin Film Ferroelectric Materials and Devices will be of great value to materials and device scientists, device and process engineers, students, and postdoctoral associates. Furthermore, this compilation will serve as a concise introduction for new entrants to this exciting field.

9781461378358 (pbk. : alk. paper): EURO 169.99 = PHYSICS


Random access memory.
Ferroelectric thin films.
Thin film devices--Materials.
Physics

621.3815 / RAM/T